This product is a semiconductor substrate cleaning agent carefully formulated from a variety of efficient and environmentally friendly chemical raw materials. It has excellent ability to remove organic pollutants, particulate matter, and oxides such as oil stains and finger prints on semiconductor substrates, without corrosion to semiconductor substrates. It does not contain ammonia nitrogen and phosphorus, and the working fluid COD is less than 300ppm. It is environmentally friendly and safe, and wastewater treatment is simple.

a) Economy: This product is a concentrated solution that can be diluted 20 times, with high economic value.

b) Efficiency: It can quickly dissolve foreign objects on semiconductor substrates and cause them to fall off, making the operation simple and convenient.

c) Safety: The semiconductor substrate is immersed at a constant temperature of 60 ℃ for 240 hours without corrosion.

d) Environmental friendliness: The working fluid has a COD<300ppm and does not contain prohibited substances such as ammonia nitrogen and phosphorus, making it an environmentally friendly product.

Method of using：

According to actual working conditions, immersion cleaning, ultrasonic cleaning, and other methods can be used. It is generally recommended to use the original solution to heat up to 45 ℃~65 ℃ to clean the semiconductor substrate. The cleaning time can be controlled within about 3min~10min according to the actual situation; After cleaning, use deionized water or ultrapure water for cleaning, and the frequency and time of cleaning are determined by the on-site process requirements.

Notes：

Do not touch the skin for a long time. If it accidentally splashes into the eyes, please rinse it with water in a timely manner.